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Hydrogen fluoride, CAS No. 7664-39-3, is a colorless and irritating gas, which is easily soluble in water. It forms hydrofluoric acid after infinite dissolution in water. It is a kind of monobasic weak acid, toxic, corrosive to skin, and can also cause harm to human body through inhalation. Therefore, in case of possible exposure to steam or smoke, wear a mask. When the skin is contaminated, take off the contaminated clothes and wash it with flowing water for 10 minutes or 2% sodium bicarbonate solution. If burned, seek medical attention. Eye contact: lift the eyelids immediately and rinse with flowing water or normal saline for at least 15 minutes.
Hydrogen fluoride is widely used in industry: it is often used in the manufacture of various fluorine-containing compounds; It can also be used as analytical reagent to produce high-purity fluoride; In the electronic industry or semiconductor industry manufacturing, it is often used as a strong acid corrosive agent, mainly used in acid pickling, corrosion, ash treatment and other processes.
In 2019, the hydrogen fluoride with purity up to 99.999% that Japan embargoed to South Korea was used for acid pickling and corrosion of wafers, circuits and chips. Hydrogen fluoride is mainly used to cut semiconductor substrates. The manufacturing of semiconductor products requires more than 600 processes, of which more than 10 processes require the use of hydrogen fluoride. Hydrogen fluoride is often used in combination with nitric acid, acetic acid, ammonia and hydrogen peroxide.
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